The SiC wafer cleaning machine has many advantages, such as a small footprint and high cost-effectiveness. It can use an ozone (O3) generator to produce ozone water, which can effectively remove organic substances, particles, and contaminants from the surface of the wafer.
SiC Wafer Cleaning System
The wafer cleaning machine is used for cleaning various types of wafers, including SiC, GaN, LT/LN, Glass, and Silicon Wafers.
